Industrial pure water generally meets the following standards: GB/T11446.1-2013 electronic-grade water.
Pure water is widely used in photovoltaics, optoelectronics, new energy, new materials, LEDs, PCBs, the chemical industry, electric power, steel, agriculture, and other industries.
Our Solutions:
A large amount of ultrapure water is used in the chip manufacturing process. The water quality requirements are extremely high, and impurities such as tiny particles, ions, and organic matter must be removed.
The reverse osmosis method separates water molecules from impurities through a semi-permeable membrane. This removes impurities, such as tiny particles and organic matter, from the water, thereby ensuring high water purity. In chip manufacturing, reverse osmosis can be used as an auxiliary ultrapure water preparation method to improve water quality further.
The ultrapure water system includes four treatment systems:
Pretreatment system; reverse osmosis system; EDI system; fine treatment system
Core Technology:
1. Innovative pretreatment system: realize low chemical consumption pretreatment system;
2. Special EDI system: achieves extremely low chemical consumption and ultra-high PPT grade silicon boron water production;
3. Special silicone and boron removal resin system: achieves the requirements of 1-5PPT grade ultrapure water;
4. Continuous detection system: realize real-time system water quality monitoring;
5. BIM: Visualize design and construction and achieve efficient implementation on site;
6. Intelligent design: Intelligent modular design, setting up a cloud data center to achieve unattended operation, early warning, and preventive maintenance.
Application:
Waste power plant leachate treatment; NF/RO concentrated drainage treatment; desulfurization wastewater zero discharge system; cooling circulating water drainage treatment; heavy metal wastewater treatment system; cutting wastewater treatment; fluorine-containing wastewater treatment; electroplating and etching wastewater treatment; high turbidity/ Impurity removal from high suspended matter wastewater; softening system.
Our Implementation:
Semiconductor silicon carbide high-tech enterprise:
Water indicators: Resistivity≥18.2MΩ·cm, TOC＜1ppb, B＜0.05ppb, DO＜10ppb, Partial＜500 pieces/L (＞0.05μm), metals＜1ppt
Main process: pretreatment + multi-stage RO + special EDI + multi-stage silicon and boron removal system + polishing and fine treatment + degassing + terminal ultrafiltration
